酸発生剤用の塩及び化学増幅型レジスト組成物,申请号JP20100120687-传众专利搜索

酸発生剤用の塩及び化学増幅型レジスト組成物

申请公布号：JP6009729(B2)

申请号：JP20100120687

申请日期：2010.05.26

申请公布日期：2016.10.19

申请人：

住友化学株式会社

发明人：市川幸司;杉原昌子;増山達郎

分类号：C07C309/12;C07C381/12;G03F7/004;G03F7/039;H01L21/027

主分类号：C07C309/12

摘要：A salt represented by the formula (I-CC): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.