PRODUCTION OF ELECTRONIC DEVICE
申请公布号:JPH08298203(A)
申请号:JP19950102106
申请日期:1995.04.26
申请公布日期:1996.11.12
发明人:UENO IWAO;WAKAHATA YASUO
分类号:H01C17/28;H01C7/12;(IPC1-7):H01C7/12
主分类号:H01C17/28
摘要:<p>PURPOSE: To prevent the resistance from increasing due to an oxide film by applying a pressure at least to a pair of electrodes provided on the surface of an element thereby breaking the oxide film on the electrode. CONSTITUTION: A lower layer 3a, i.e., an outer electrode of Ni, is formed on the end face of a multilayer varistor element 1 and then it is reduced and fired. An upper layer 3b, i.e., an outer electrode of Ag, is then formed thereon and subjected to simultaneous reoxidation and firing. Subsequently, the upper layer 3b, i.e., the outer electrode of Ag, is pierced with a needle 15 and applied with a pressure thus breaking a barrier layer 3c. Finally, a plating electrode is formed on the surface by Ni plating and solder plating thus laminating 30 layers of inner electrodes 2. A multilayer varistor element 1 thus produced has an equivalent series resistance ESR lowered from 100KΩ-10MΩdown to 40-100mΩafter breakage of the barrier layer 3c.</p>