DIE-BONDING LAYER FORMATION FILM, WORKPIECE HAVING DIE-BONDING LAYER FORMATION FILM ATTACHED THERETO, AND SEMICONDUCTOR DEVICE
申请公布号:SG11201607777U(A)
申请号:SG11201607777U
申请日期:2015.03.16
申请公布日期:2016.11.29
发明人:AZUMA, YUICHIRO;SUZUKI, HIDEAKI;SAIKI, NAOYA;SAGAWA, YUTA
分类号:H01L21/52
主分类号:H01L21/52
摘要:A die-bonding layer formation film to be used for fixing a processed product to an adherend, includes an adhesive layer, wherein, the storage elastic modulus has a local minimum value at a temperature within a range of 80° C. to 150° C., wherein the adhesive layer has a shear strength to a peeling strength test substrate of 20 N/2 mm□ or more and 50 N/2 mm□ or less, wherein the shear strength is measured after the processed product is placed above the peeling strength test substrate via the die-bonding layer formation film and the die-bonding layer formation film on the peeling strength test substrate is heated at 175° C. for 1 hour and then further maintained under an environment of 250° C. for 30 seconds. Bubbles (voids) are unlikely to grow at the boundary between the adhesive layer and an adherend even when subjected to thermal history.