一种纳米压印模板制备方法
申请公布号:CN105824190A
申请号:CN201610369964.2
申请日期:2016.05.30
申请公布日期:2016.08.03
发明人:李东栋;许贞;邓昌凯;马朋莎;王敏;罗晓雷;殷敏;鲁林峰;陈小源
分类号:G03F7/00(2006.01)I
主分类号:G03F7/00(2006.01)I
代理人:余明伟
地址:201210 上海市浦东新区海科路99号
摘要:本发明提供一种纳米压印模板制备方法,所述方法包括以下步骤:提供具有微纳米尺寸的三维图形结构的原始模板;在基底上涂覆溶胶作为衬底;利用所述原始模板通过压印技术在所述衬底上压印出所述微纳米尺寸的三维图形结构的互补图形并固化;将得到的具有所述互补图形的所述衬底作为模板在后续的纳米压印工艺中使用。本发明的纳米压印模板制备方法可重复性高,可快速、大规模、低成本制备无机物模板且可用于紫外压印、热压印等过程,所制得的模板有较高的机械强度、重复利用性高、在后续压印过程中保形性好,将其作为掩膜版使用经过刻蚀后能得到更高纵深比的基底材料,能有效避免光刻胶作为掩膜版带来的刻蚀之后结构较浅的困境。
主权项:一种纳米压印模板的制备方法,其特征在于,所述方法包括以下步骤:提供具有微纳米尺寸的三维图形结构的原始模板;在基底上涂覆溶胶作为衬底;利用所述原始模板通过压印技术在所述衬底上压印出所述微纳米尺寸的三维图形结构的互补图形并固化;将得到的具有所述互补图形的所述衬底作为模板在后续的纳米压印工艺中使用。
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