COMPOUND, RESIN, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN,申请号JP20150217449-传众专利搜索

COMPOUND, RESIN, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN

申请公布号：JP2016094598(A)

申请号：JP20150217449

申请日期：2015.11.05

申请公布日期：2016.05.26

申请人：

SUMITOMO CHEMICAL CO LTD

发明人：ADACHI YUKAKO;FUJITA SHINGO;ICHIKAWA KOJI

分类号：C08F20/28;C07C69/63;G03F7/038;G03F7/039;G03F7/20

主分类号：C08F20/28

摘要：PROBLEM TO BE SOLVED: To provide a compound, a resin, and a resist composition, from which a resist pattern having good CD (critical dimension) uniformity can be produced.SOLUTION: The compound is represented by formula (I). The resin and the resist composition comprise a structural unit derived from the above compound. In the formula (I), Rrepresents a hydrogen atom, a halogen, or an alkyl group having 1 to 6 carbon atoms which may have a halogen; Rrepresents a perfluoroalkyl group or *-CHRfRf, where Rfand Rfeach independently represent a perfluoroalkyl group; Arepresents a single bond, an alkanediyl group, or the like; Arepresents an alkanediyl group; and Wrepresents a divalent alicyclic hydrocarbon group, and particularly, Wpreferably represents an adamantanediyl group or a cyclohexadiyl group.SELECTED DRAWING: None