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VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND ORGANIC EL ELEMENT
申请公布号：JP2016035089(A)
申请号：JP20140158220
申请日期：2014.08.01
申请公布日期：2016.03.17
发明人：OCHI TAKASHI;KAWATO SHINICHI;KOBAYASHI ISATAKE;MATSUNAGA KAZUKI;KIKUCHI KATSUHIRO;ICHIHARA MASAHIRO;MATSUMOTO EIICHI
分类号：C23C14/24;H01L51/50;H05B33/10
主分类号：C23C14/24
摘要：PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method, capable of forming accurately a co-vapor-deposited film, even when co-depositing two or more kinds of materials; and to provide an organic EL element using the same.SOLUTION: A vapor deposition apparatus 11 is provided with: first and second vapor deposition sources 12 and 13; common piping 27 connected to the first and second vapor deposition sources 12 and 13; a vapor deposition particle emission source 29 connected to the common piping 27, for emitting vapor deposition particles from each of the first and second vapor deposition sources 12 and 13; an exhaust valve 32 connected to the vapor deposition particle emission source 29; and an air displacement pump 34 connected to the exhaust valve 32.SELECTED DRAWING: Figure 2
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