PLASMA GENERATION CHAMBER WITH SMOOTH PLASMA RESISTANT COATING,申请号US201514820440-传众专利搜索

PLASMA GENERATION CHAMBER WITH SMOOTH PLASMA RESISTANT COATING

申请公布号：US2016042924(A1)

申请号：US201514820440

申请日期：2015.08.06

申请公布日期：2016.02.11

申请人：

Applied Materials, Inc.

发明人：Kim Sung Je;Park Soonam;Lubomirsky Dmitry

分类号：H01J37/32;C23C14/08

主分类号：H01J37/32

地址：Santa Clara CA US

摘要：A faceplate or a selectivity modulation device (SMD) for a plasma generation chamber has a plasma resistant ceramic coating on a surface of the faceplate or SMD, wherein the plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%.

主权项：1. A plasma generation chamber comprising: a faceplate having a first plasma resistant ceramic coating on a surface of the faceplate, wherein the first plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%; a selectivity modulation device (SMD) having a second plasma resistant ceramic coating on a surface of the SMD, wherein the second plasma resistant ceramic coating comprises a thickness of less than approximately 30 microns, a porosity of less than 1% and a thickness non-uniformity of less than 4%; and a dielectric separator separating the faceplate from the selectivity modulation device; wherein the plasma generation chamber is to generate plasma for a processing chamber by accelerating radicals from the faceplate toward the SMD and through a plurality of holes in the SMD.