EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD,申请号JP20150201563-传众专利搜索

EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

申请公布号：JP2016014895(A)

申请号：JP20150201563

申请日期：2015.10.09

申请公布日期：2016.01.28

申请人：

NIKON CORP

发明人：SHIBAZAKI YUICHI

分类号：G03F7/20;G03F9/00;H01L21/027;H01L21/68;H01L21/683

主分类号：G03F7/20

摘要：PROBLEM TO BE SOLVED: To provide a substrate holding apparatus which can easily performing maintenance work and prevent liquid from penetrating into a rear surface side of a substrate.SOLUTION: A substrate holder PH comprises: base material PHB; a first holding part PH1 which is formed on the base material PHB and holds a substrate P by suctioning the substrate; and a second holding part PH2 which is formed on the base material PHB and holds a plate member T by suctioning the plate member near the substrate P suctioned and held by the first holding part PH1. In an exposure device comprising the substrate holder PH, replace of a plate can be easily performed and maintenance work can be easily performed. Therefore, the exposure device is suitable for immersion exposure.