SRAM cells with dummy insertions

申请公布号：US9053974(B2)

申请号：US201213594620

申请日期：2012.08.24

申请公布日期：2015.06.09

申请人：

Taiwan Semiconductor Manufacturing Company, Ltd.

发明人：Chen Chao-Hsuing;Wang Ling-Sung;Lin Chi-Yen

分类号：H01L21/70;H01L27/11;H01L27/02

主分类号：H01L21/70

代理机构：

Slater & Matsil, L.L.P.

代理人：Slater & Matsil, L.L.P.

地址：Hsin-Chu TW

摘要：A device includes a first pull-up transistor, a second pull-up transistor, and a dummy gate electrode between the first and the second pull-up transistors. The first and the second pull-up transistors are included in a first Static Random Access Memory (SRAM) cell.

主权项：1. A device comprising: a first pull-up transistor; a second pull-up transistor; and a dummy gate electrode between the first and the second pull-up transistors, wherein the first and the second pull-up transistors are comprised in a first Static Random Access Memory (SRAM) cell.

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