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HIGH VOLTAGE DEVICE AND MANUFACTURING METHOD THEREOF

申请公布号:US2013270634(A1)

申请号:US201213445151

申请日期:2012.04.12

申请公布日期:2013.10.17

申请人:
HUANG TSUNG-YI;CHIU CHIEN-WEI;RICHTEK TECHNOLOGY CORPORATION

发明人:HUANG TSUNG-YI;CHIU CHIEN-WEI

分类号:H01L29/78;H01L21/336

主分类号:H01L29/78

摘要:The present invention discloses a high voltage device and a manufacturing method thereof. The high voltage device is formed in a first conductive type substrate. A low voltage device is also formed in the substrate. The high voltage device includes a drift region, a gate, a source, a drain, and a mitigation region. The mitigation region has a second conductive type, and is formed in the drift region between the gate and drain. The mitigation region is formed by a process step which also forms a lightly doped drain (LDD) region in the low voltage device.

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