HIGH VOLTAGE DEVICE AND MANUFACTURING METHOD THEREOF
申请公布号:US2013270634(A1)
申请号:US201213445151
申请日期:2012.04.12
申请公布日期:2013.10.17
发明人:HUANG TSUNG-YI;CHIU CHIEN-WEI
分类号:H01L29/78;H01L21/336
主分类号:H01L29/78
摘要:The present invention discloses a high voltage device and a manufacturing method thereof. The high voltage device is formed in a first conductive type substrate. A low voltage device is also formed in the substrate. The high voltage device includes a drift region, a gate, a source, a drain, and a mitigation region. The mitigation region has a second conductive type, and is formed in the drift region between the gate and drain. The mitigation region is formed by a process step which also forms a lightly doped drain (LDD) region in the low voltage device.