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TUBE-SHAPED SPUTTERING TARGET

申请公布号:KR20120096426(A)

申请号:KR20120016571

申请日期:2012.02.17

申请公布日期:2012.08.30

申请人:
HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG

发明人:SIMONS CHRISTOPH;SCHLOTT MARTIN;HEINDEL JOSEF;STAHR CHRISTOPH

分类号:C23C14/34

主分类号:C23C14/34

摘要:PURPOSE: A tube-shaped sputtering target is provided to equally form a microstructure across the thickness of a sputtering target and the surface of a jacket by manufacturing the sputtering target in the form of a layer. CONSTITUTION: A tube-shaped sputtering target has a carrier tube and an in-based sputtering material. The sputtering material is arranged in the carrier tube. A microstructure of the sputtering material has a mean particle size below 1mm measured as a mean diameter of the particles on the sputtering-roughened surface of the sputtering material. The sputtering material contains the fraction of 1wt.% of copper and/or gallium at maximum.

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