Method and device for detecting leaks by optical emission spectroscopy

申请公布号：EP1914532(A2)

申请号：EP20070118244

申请日期：2007.10.10

申请公布日期：2008.04.23

申请人：

ALCATEL LUCENT

发明人：BOUNOUAR, JULIEN

分类号：G01M3/22;G01M3/38

主分类号：G01M3/22

摘要：<p>The method involves setting an enclosure i.e. vacuum chamber (1), of a silicon wafer processing/transferring equipment in depression opposite to outer atmosphere by a vacuum pumping device (15). A gas e.g. argon, or a mixture of majority gas in which a test gas e.g. oxygen, nitrogen and water gas, in the atmosphere, is absent, is contained in the chamber. A plasma of gas that is present inside the chamber, is generated. A presence of a distinctive spectral line of the test gas is detected in an optical spectrum of radiation that is emitted by the gas plasma. An independent claim is also included for a gas leakage detecting device comprising a plasma generating device.</p>

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