METHOD AND SYSTEM FOR DOUBLE-SIDED PATTERNING OF SUBSTRATES,申请号WO2006US46256-传众专利搜索

METHOD AND SYSTEM FOR DOUBLE-SIDED PATTERNING OF SUBSTRATES

申请公布号：WO2007067488(A2)

申请号：WO2006US46256

申请日期：2006.11.30

申请公布日期：2007.06.14

申请人：

MOLECULAR IMPRINTS, INC.

发明人：CHOI, BYUNG-JIN;SREENIVASAN, SIDLGATA V.

分类号：B29C35/02

主分类号：B29C35/02

摘要：The present invention is directed towards a method and a system of patterning first and second opposed sides of a substrate. The method and system may employ a mold assembly and obtaining a desired spatial relationship between the first and second opposed sides of the substrate and the mold assembly. In a further embodiment, the method and system may employ a first and a second mold assembly.