电浆处理方法及电浆处理设备

申请公布号：TW200714139

申请号：TW094133489

申请日期：2005.09.27

申请公布日期：2007.04.01

申请人：

大见忠弘

发明人：大见忠弘;寺本章伸

分类号：H05H1/24(2006.01);H01L21/3065(2006.01)

主分类号：H05H1/24(2006.01)

代理人：周良谋

地址：日本

摘要：尽可能抑制昂贵的氪气、氙气消耗量之同时，亦降低电浆处理时对被处理物造成之损坏。使用稀有气体对基板进行电浆处理时，使用2种以上不同种类之稀有气体。稀有气体中之一种系为廉价之氩气，其他气体则为与电子碰撞剖面积较氩气为大之氪气及氙气之任一种，或为氪气以及氙气，尽可能于抑制昂贵的氪气、氙气消耗量之同时，亦降低电浆处理时对被处理物造成之损坏。

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