In-situ surface treatment for memory cell formation

申请公布号：US2005227382(A1)

申请号：US20040817131

申请日期：2004.04.02

申请公布日期：2005.10.13

申请人：

HUI ANGELA T

发明人：HUI ANGELA T.

分类号：H01L21/00;H01L21/311;(IPC1-7):H01L21/66

主分类号：H01L21/00

摘要：A system and methodology are disclosed for forming a passive layer on a conductive layer, such as can be done during fabrication of an organic memory cell, which generally mitigates drawbacks inherent in conventional inorganic memory devices. The passive layer includes a conductivity facilitating compound, such as copper sulfide (Cu<SUB>2</SUB>S), which is generated from an upper portion of a conductive material. The conductive material can serve as a bottom electrode in the memory cell, and the upper portion of the conductive material can be transformed into the passive layer via treatment with a plasma generated from fluorine (F) based gases.

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