APPARATUS FOR CLEANING FUNCTION-EXPOSED SURFACE OF INSTRUMENT, COMPONENT OR THE LIKE,申请号JP20030079208-传众专利搜索

APPARATUS FOR CLEANING FUNCTION-EXPOSED SURFACE OF INSTRUMENT, COMPONENT OR THE LIKE

申请公布号：JP2003290723(A)

申请号：JP20030079208

申请日期：2003.03.20

申请公布日期：2003.10.14

申请人：

TOHO KOGYO KK

发明人：MORIYA KENICHI;IKEZAKI YASUO

分类号：B08B1/00;G11B23/50;(IPC1-7):B08B1/00

主分类号：B08B1/00

摘要：PROBLEM TO BE SOLVED: To provide an apparatus for cleaning the function-exposed surface of an instrument, a component or the like, by which the surface to be cleaned such as a liquid crystal screen and the recorded surface of an optical disk can be wiped uniformly in wide wiping width and the stain existing on the surface to be cleaned can be wiped out efficiently without damaging the surface to be cleaned by sending out a new wiping portion of wiping cloth easily without wasting the wiping cloth. SOLUTION: This apparatus has a box unit which is composed of a bottom part having a bottom wall and sidewalls and a cover part to be fit to the bottom part to be opened or closed and whose front edge is opened, a rewinding reel and a winding reel supported pivotally by the side parts of the box unit for rewinding and winding the belt-like wiping cloth housed in the box unit respectively, a cylindrical part which is supported pivotally by the box unit for rolling-back the wiping cloth and the peripheral part of which is exposed partially from the opened front edge of the box unit, a knob mounted in the box unit for rotary operating the winding reel and a wiping cloth fixing/releasing means provided with a wiping cloth restricting lever for pressing the wiping cloth to the bottom wall of the bottom part by the pressing force of a spring of a spring means and a press-moving knob exposed from the top surface of the cover part for releasing the pressing of the wiping cloth restricting lever. COPYRIGHT: (C)2004,JPO