ELECTRON SOURCE SUBSTRATE AND ITS MANUFACTURING METHOD AS WELL AS IMAGE FORMING DEVICE USING THE ELECTRON SOURCE SUBSTRATE,申请号JP20010357712-传众专利搜索

ELECTRON SOURCE SUBSTRATE AND ITS MANUFACTURING METHOD AS WELL AS IMAGE FORMING DEVICE USING THE ELECTRON SOURCE SUBSTRATE

申请公布号：JP2003157775(A)

申请号：JP20010357712

申请日期：2001.11.22

申请公布日期：2003.05.30

申请人：

CANON INC

发明人：ARAI YOSHITAKA;KOBAYASHI TAMAKI;MIYAZAKI KAZUYA

分类号：H01J9/02;H01J1/316;H01J29/04;H01J31/12;(IPC1-7):H01J29/04

主分类号：H01J9/02

摘要：<p>PROBLEM TO BE SOLVED: To provide an electron source substrate and its manufacturing method with degradation prevented of electron emission characteristics of an electron emission element due to diffusion of wiring metal through an element electrode to conductive thin films, and an image forming device by the use of the electron source substrate. SOLUTION: With the electron source substrate with an electron emission element having an electron-emitting part each formed on a pair of element electrodes connected to metal wiring, the element electrodes are all or partly made of a heat-resistant alloy, and that, standard electrode potential of elements constituting the heat-resistant alloy is lower than that of elements constituting the metal wiring.</p>