PRE-ALIGNMENT SYSTEM WITH WAFER EDGE EXPOSURE APPARATUS,申请号KR20010042772-传众专利搜索

PRE-ALIGNMENT SYSTEM WITH WAFER EDGE EXPOSURE APPARATUS

申请公布号：KR20030006828(A)

申请号：KR20010042772

申请日期：2001.07.16

申请公布日期：2003.01.23

申请人：

SAMSUNG ELECTRONICS CO., LTD.

发明人：KIM, JONG HYEON

分类号：H01L21/027;(IPC1-7):H01L21/027

主分类号：H01L21/027

摘要：PURPOSE: A pre-alignment system with a wafer edge exposure(WEE) apparatus is provided to improve productivity by simultaneously performing an alignment process and an edge exposure process, and to more precisely perform an edge exposure process by using laser as a light source. CONSTITUTION: A rotation axis(10) is prepared. A wafer(20) is placed on a stage installed on the rotation axis. An align sensor aligns the wafer on the stage. An edge exposure apparatus performs an edge exposure process of the wafer. The light source(60) irradiates light to the wafer. A control unit(70) controls the width of the light irradiated from the light source. The edge exposure apparatus includes the light source and the control unit.