HIGH TEMPERATURE REFLECTING OPTICAL DEVICE,申请号JP19990319368-传众专利搜索

HIGH TEMPERATURE REFLECTING OPTICAL DEVICE

申请公布号：JP2000147223(A)

申请号：JP19990319368

申请日期：1999.11.10

申请公布日期：2000.05.26

申请人：

BWX TECHNOLOGIES INC

发明人：MILES BARRY JOHN;WESTERMANE KURT OGG

分类号：G02B5/08;G02B1/10;(IPC1-7):G02B5/08

主分类号：G02B5/08

摘要：PROBLEM TO BE SOLVED: To suppress the reduction of reflectance and the occurrence of local hot spots due to the sticking of particulates and other contaminants to a hot optical surface by providing a graphite substrate having the shape of an optical surface, a rhenium layer formed on the optical surface and an iridium layer formed on the rhenium layer. SOLUTION: The body of the reflecting optical device 10, that is, the substrate comprises graphite. The reflecting optical device 10 can be formed in the desired shape by mechanically working a graphite block. The optical surface 20, 22 is then polished. A rhenium layer 26 is formed as a buffer layer on the polished optical surface preferably by chemical vapor deposition. This rhenium layer 26 is treated (polished and lapped) so as to eliminate deviation. An iridium layer 28 is further deposited on the rhenium layer 26 by a chemical vapor deposition. This iridium layer 28 is mirror-finished by polishing. A rhodium layer 30 used as an outer reflecting surface may be formed on the entire surface of the iridium layer 28.