Fluid nozzle system, energy emission system for photolithography and its method of manufacture,申请号AU19990034699-传众专利搜索

Fluid nozzle system, energy emission system for photolithography and its method of manufacture

申请公布号：AU3469999(A)

申请号：AU19990034699

申请日期：1999.04.02

申请公布日期：1999.10.25

申请人：

ADVANCED ENERGY SYSTEMS, INC.

发明人：EDWIN G. HAAS;ROBERT M. GUTOWSKI;VINCENT S. CALIA

分类号：B05B1/00;B05B1/34;G03F7/20;H01L21/027;H05G2/00

主分类号：B05B1/00

摘要：An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118). The method of manufacture may include fabricating a recess (206) in a first side (202) of an article (200). An article passage (216) may be fabricated between a second side (204) of the article (200) and the recess (206). An insert (220) may be provided sized to fit the recess (206). An insert passage (230) may be fabricated in the insert (220). The insert (220) may then be secured in the recess (206), with the insert passage (230) and the article passage (216) aligned.