Method and apparatus for charged particle beam exposure,申请号EP19970308800-传众专利搜索

Method and apparatus for charged particle beam exposure

申请公布号：EP0871071(A2)

申请号：EP19970308800

申请日期：1997.11.03

申请公布日期：1998.10.14

申请人：

FUJITSU LIMITED;ADVANTEST CORPORATION

发明人：KAWAKAMI, KENICHI;SUSA, MASAHIKO;YAMASHITA, KOICHI;KATSUHIKO, KOBAYASHI;YAMADA, AKIO;NISHIO, NAOKI

分类号：H01J37/20;G03F7/20;H01J37/147;H01J37/302;H01L21/027

主分类号：H01J37/20

摘要：The present invention is a method of charged particle beam exposure wherein an area of an exposure pattern is exposed by irradiating a sample (36) with a charged particle beam while moving said sample, comprising: a step of generating speed data including the speed distribution in a direction of movement of the sample in accordance with secondary data which is generated from a pattern data including at least data (37) of the exposure pattern and data (38) of an exposure position, and includes at least density information of the exposure pattern; and a step of irradiating the sample (36) with the charged particle beam in accordance with the pattern data while being moved at variable speed in accordance with the speed data. According to the invention, the through-put is improved very much without any defect of the exposure. <IMAGE>