PHOTOSENSITIVE COMPOSITION,申请号JP19960199154-传众专利搜索

PHOTOSENSITIVE COMPOSITION

申请公布号：JPH1039511(A)

申请号：JP19960199154

申请日期：1996.07.29

申请公布日期：1998.02.13

申请人：

FUJI PHOTO FILM CO LTD

发明人：KODAMA KUNIHIKO;AOSO TOSHIAKI

分类号：G03F7/004;C07C381/04;G03F7/00;G03F7/039;H01L21/027;(IPC1-7):G03F7/039

主分类号：G03F7/004

摘要：PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. having high resolving power without deteriorating sensitivity and giving a resist pattern whose surface does not form a T-top with the lapse of time after exposure by incorporating a specified compd. SOLUTION: This photosensitive compsn. contains a compd. represented by formula I or II and generating an acid when irradiated with active light or radiation. In the formulae I, II (1) is 1-3, (m) is 2 or 3, A1 is cycloalkyl, -(CX2 )n -Z, etc., A2 is cycloakly or -(CX2 )a -A-(CX2 )b -Z in the case of 1=1, A2 is alkylene, arylene, etc., in the case of 1=2 or 3, Y1 has the same alkylene, arylene, etc., in the case of 1=2 or 3, Y1 has the same meaning as A2 in the case of 1=1, Y2 is cycloakylene, arylene, etc., (n) is 1-20, each of (a) and (b) is 0-20, X is H or halogen, Z is H, halogen aryl, etc., and A is a single bond, O, etc.