RADIATION DIFFRACTION APPARATUS,申请号JP19870057933-传众专利搜索

RADIATION DIFFRACTION APPARATUS

申请公布号：JPS63225158(A)

申请号：JP19870057933

申请日期：1987.03.14

申请公布日期：1988.09.20

申请人：

RICOH CO LTD

发明人：TANI KATSUHIKO;HAYASHI YASUAKI

分类号：G01N23/207;G21K1/06

主分类号：G01N23/207

摘要：PURPOSE:To enhance a sensitivity, by a method wherein the scattering radiation scattered in a specimen is condensed by an asymmetric monochrometer to be received on a wide area and also converted to a fine diffracted beam to be condensed to a radiation detector. CONSTITUTION:This diffraction apparatus is constituted of an X-ray source 10, a diffusion slit 12, a solar slit 14, a light receiving slit 16, an asymmetricall cut monochrometer 20 and a scintillation counter 22. The fanwise support table 32 of a detection part 30 is rotated around a specimen 18 and the scintillation counter support table 36 is rotated around the monochrometer support table 34. Since a monochrometer is used as the asymmetric monochrometer, the scattering X-ray signal scattered in the specimen 18 to pass through a slit 14 is received by a wide area and converted to a fine diffracted beam to be reflected toward the slit 16 and the sensitivity in the counter 22 can be enhanced.