FORMATION OF POLYMER MEMBRANE HAVING ASYMMETRIC CHEMICAL STRUCTURE,申请号JP19830025340-传众专利搜索

FORMATION OF POLYMER MEMBRANE HAVING ASYMMETRIC CHEMICAL STRUCTURE

申请公布号：JPS59149932(A)

申请号：JP19830025340

申请日期：1983.02.16

申请公布日期：1984.08.28

申请人：

KOGYO GIJUTSUIN (JAPAN)

发明人：MASUOKA TOSHIO;HIRASA OKIHIKO;SUDA MASAO

分类号：C08J7/00

主分类号：C08J7/00

摘要：PURPOSE:To form the titled polymer membrane which is resistant to peeling or exudation even in water at high conversion of monomer vapor, by contacting one surface of a polymer membrane with a low-temperature plasma and diffusing a plasma-polymerizable monomer from the opposite side into the membrane. CONSTITUTION:One surface of a polymer membrane (e.g., silicon rubber membrane) is contacted with a low-temperature plasma, and a plasma-polymerizable monomer (e.g., allylamine) is diffused from the opposite surface into the membrane to form a thin film containing a plasma-polymerizable polymer on the surface of the polymer membrane in contact with the plasma. As compared with the conventional plasma treatment process, the process of this invention is advantageous in that the conversion of a monomer vapor is high, the chemical structure inherent in the monomer can easily be retained, damages, such as coloration of the polymer membrane are small, the thickness of the surface layer to which the effect of treatment reaches is relatively large, its thickness can be controlled by a monomer vapor pressure or a membrane temperature, the treated layer consists of substantially completely integrated plasma-polymerized polymer and the matrix, and this layer is resistant to peeling or exudation even in water.