PRODUCTION OF SEMICONDUCTOR DEVICE,申请号JP19990167883-传众专利搜索

PRODUCTION OF SEMICONDUCTOR DEVICE

申请公布号：JP2000357640(A)

申请号：JP19990167883

申请日期：1999.06.15

申请公布日期：2000.12.26

申请人：

NEC YAMAGATA LTD

发明人：SUGAI TOSHIYUKI

分类号：H01L21/02;(IPC1-7):H01L21/02

主分类号：H01L21/02

摘要：PROBLEM TO BE SOLVED: To obtain a production method of semiconductor element which can be applied even to a logic having different pattern by identifying the position of a pellet on a wafer. SOLUTION: The production method of semiconductor element comprises a step for performing exposure again using an exposing reticle having a pattern for passing UV-rays or infrared rays only partially before photoresist is developed with developer when a plurality of pellets 1, 2, 3, 4 are produced from a sheet of semiconductor wafer 5. The mask used for re-exposure only has an opening for generating an identification pattern of a single pellet and it is stepped in X and Y directions by a step width different from the dimension of the pellet. That dimension is equal to the pellet width±α, whereαcorresponds to the interval of the identification pattern and the stepping direction 6 is shown by a dot line on the drawing.