UN METODO DE SUPRIMIR EL DESPRENDIMIENTO DE HALOGENO GASEO-SO DESDE UNA DISOLUCION DE ELECTROCHAPADO.,申请号ES19790003789-传众专利搜索

UN METODO DE SUPRIMIR EL DESPRENDIMIENTO DE HALOGENO GASEO-SO DESDE UNA DISOLUCION DE ELECTROCHAPADO.

申请公布号：ES378979(A1)

申请号：ES19790003789

申请日期：1970.04.23

申请公布日期：1972.08.01

申请人：

EFCO LIMITED

分类号：C25D3/02;(IPC1-7):23B/

主分类号：C25D3/02

摘要：<p>1304844 Electrodeposition of metal OXY METAL FINISHING (GREAT BRITAIN) Ltd 24 April 1970 [24 April 1969] 21122/69 Heading C7B Metal is electrodeposited on to a substrate using an insoluble anode and an electrolyte containing halide ions, ions of the metal to be deposited, and an organic compound which contains an electron-accepting group and which is oxidized at the anode in preference to the halide ions. Suitable electron-accepting groups include hydroxyl, amino, carbonyl and aldehyde groups; the molecule preferably containing two such groups, or one plus a carboxyl or sulphonic acid group. Various examples are given of suitable hydroxycarboxylic acids e.g. citric and tartaric acids, sulphonic acids, amines, aldehydes, polyhydric alcohols, etc. Metals which may be deposited include chromium, nickel, cobalt, zinc and ruthenium. The insoluble anode used may be platinized nickel, platinized titanium or carbon. The bath may include brighteners and may be agitated by passage of air through the bath. The substrate may be ferrous, carry a nickel plating (if chromium is being deposited) or be of plastics material rendered electrically conductive. The chromium may be deposited from a chromium chloride bath.</p>