ETCHANT AND PATTERNING METHOD OF TRANSPARENT CONDUCTOR,申请号JP20150050633-传众专利搜索

ETCHANT AND PATTERNING METHOD OF TRANSPARENT CONDUCTOR

申请公布号：JP2016171226(A)

申请号：JP20150050633

申请日期：2015.03.13

申请公布日期：2016.09.23

申请人：

KONICA MINOLTA INC

发明人：KUMAGAI TAKENORI

分类号：H01L21/306;H01L21/308

主分类号：H01L21/306

摘要：PROBLEM TO BE SOLVED: To provide an etchant for suppressing an amount of side etching.SOLUTION: Disclosed is the etchant for patterning a transparent conductor (10) which has a layer structure obtained by sequentially laminating a zinc sulfide layer (2), a sliver containing metal layer (3), a protective layer (4) and a high refractive index conductive layer (5) on a base material (1) and in which layer thickness of the silver containing metal layer (3) is within a range of 5 to 15 nm. In the etchant, at least one acid selected from nitric acid, hydrochloric acid, phosphoric acid, oxalic acid and sulfuric acid is contained.SELECTED DRAWING: Figure 1