CHIP FOR HALL SENSOR
申请公布号:JP2000183423(A)
申请号:JP19980352942
申请日期:1998.12.11
申请公布日期:2000.06.30
发明人:KUNITAKE EIICHI
分类号:H01L43/06;G01R33/07;(IPC1-7):H01L43/06
主分类号:H01L43/06
摘要:PROBLEM TO BE SOLVED: To suppress a change in unbalanced voltage due to a change in temperature by forming a chip with a semi-insulating GaAs substrate and an undoped GaAs layer of a specified thickness formed on the surface of an electron mobility layer. SOLUTION: This chip consists of a semi-insulating GaAs substrate 1, an electron mobility layer 2 constituted of an n-type Gaps epitaxial layer grown on the substrate 1 by a MOVPE method, an undoped GaAs layer grown on the layer 2. The substrate 1, the electron mobility layer 2, and the undoped GaAs layer 3 are processed by etching into a specified shape, for example, a cross shape to form a magneto sensitive section 4. The magneto sensitive section 4 is installed at a specified place with an electrode and is provided with a protective film. In a region where the thickness of the undoped GaAs layer 3 is 0.3μm or above, unbalanced voltage is reduced.
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