CHEMICALLY AMPLIFIED RESIST COMPOSITION

申请公布号：JP2008181119(A)

申请号：JP20070336495

申请日期：2007.12.27

申请公布日期：2008.08.07

申请人：

SUMITOMO CHEMICAL CO LTD

发明人：ARAKI KO;YAMAGUCHI NORIFUMI;YAMAMOTO SATOSHI

分类号：G03F7/004;G03F7/039;H01L21/027

主分类号：G03F7/004

摘要：<P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition which exhibits high resolution and gives good line edge roughness. <P>SOLUTION: The chemically amplified resist composition comprises an acid generator comprising an onium salt represented by formula (I) (wherein R<SP>21</SP>represents a linear or branched 1-20C hydrocarbon group which may be substituted or a 3-30C cyclic hydrocarbon group which may be substituted, provided that a carbon atom contained in the hydrocarbon group or the cyclic hydrocarbon group may be substituted by a carbonyl group or an oxygen atom, and Q<SP>1</SP>and Q<SP>2</SP>each independently represent a fluorine atom or a 1-6C perfluoroalkyl group) and a sulfonium salt represented by formula (II); and a resin which contains a polymerized unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid. <P>COPYRIGHT: (C)2008,JPO&INPIT

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