Photosensitive Resin Composition with Good Stripper-Resistance for Color Filter and Color Filter Formed Using the Same,申请号US20080337743-传众专利搜索

Photosensitive Resin Composition with Good Stripper-Resistance for Color Filter and Color Filter Formed Using the Same

申请公布号：US2009155717(A1)

申请号：US20080337743

申请日期：2008.12.18

申请公布日期：2009.06.18

申请人：

CHEIL INDUSTRIES INC.

发明人：CHO SANG-WON;HAN GYU-SEOK;PAEK HO-JEONG;LEE MYUNG-JIN;JIN SUN-HEE;LEE CHEON-SEOK

分类号：G03F7/028

主分类号：G03F7/028

摘要：The present invention relates to a photosensitive resin composition for a color filter, which has an excellent stripper-resistance and is developed by an alkali aqueous solution, and a color filter formed of the photosensitive resin composition. The photosensitive resin composition includes: (A) a carboxyl-containing acryl-based binder resin; (B) a double bond-containing acryl carboxylate resin represented by the following Formula 1; (C) an acryl-based photopolymerization monomer; (D) a photopolymerization initiator; (E) a pigment; and (F) a solvent. The photosensitive resin composition has excellent stripper resistance, and thus can be used when a color filter is fabricated on a TFT array substrate in order to ensure a high aperture ratio. In the above formula, R1 is hydrogen or methyl, R2 is hydrogen, hydroxyl, C1 to C10 alkyl, or -CO-R5-COOH wherein R5 is a moiety derived from an acid anhydride, R3 is R6COO- wherein R6 is aryl, R4 is R7COO- wherein R7 is alkyl, 5<=m<=50, 1<=n<=20, and 10<=o<=100.