PHOTO SOLDER RESISTS COMPOSITION

申请公布号：JPH0695384(A)

申请号：JP19920269405

申请日期：1992.09.11

申请公布日期：1994.04.08

申请人：

TOYO INK MFG CO LTD

发明人：SHIRAISHI KINYA;WATANABE KATSUMI

分类号：C09D11/00;G03F7/027;G03F7/031;G03F7/032;G03F7/038;H05K3/28;(IPC1-7):G03F7/038

主分类号：C09D11/00

摘要：<p>PURPOSE:To provide an alkali developable photo solder resist excellent in reliability and resolution. CONSTITUTION:When a photo solder resist compsn. is composed essentially of 100 pts.wt. photopolymerizable resin (A) having a carboxyl group and/or a sulfonic acid group in each molecule, 1-30 pts.wt. photo-polymn. initiator and/or photopolymn. accelerator (B), 10-100 pts.wt. compd. (C) which has at least one epoxy group, is solid at ordinary temp. and slightly soluble in a diluent and 0.2-100 pts.wt. compd. (D) which has at least one epoxy group and is liq. at ordinary temp. or soluble in the diluent, the compds. C, D are first mixed and heated to a temp. above the m.p. of the compd. C to melt the compd. C. After the resulting liq. mixture is cooled if necessary, the compd. C is formed into fine particles with a dispersing machine.</p>

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