PHOTORESIST COMPOSITION FOR LCD, WHICH MINIMIZES ATTACKS GENERATED DURING DRY ETCHING PROCESS BY ERECTING THE PROFILE UPRIGHT

申请公布号：KR20040077277(A)

申请号：KR20030012778

申请日期：2003.02.28

申请公布日期：2004.09.04

申请人：

SAMSUNG ELECTRONICS CO., LTD.

发明人：JU, JIN HO;KANG, SEONG CHEOL;LEE, DONG GI;LEE, YU GYEONG

分类号：G03F7/023;(IPC1-7):G03F7/023

主分类号：G03F7/023

摘要：PURPOSE: A photoresist composition for an LCD is provided to minimize attacks generated during a dry etching process by erecting the profile upright, thereby improving production yield and contrast. CONSTITUTION: The photoresist composition for an LCD circuit comprises (a) 10-20wt% of a novolac resin with a molecular weight of 2000-12000, (b) 10-30wt% of a diazide photosensitive compound where a sensitizer for G-ray and a sensitizer for I-ray are blended with a ratio of 1:2 to 2:1, and (c) the balance of an organic solvent.

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