PROJECTION EXPOSURE APPARATUS,申请号JP19850042719-传众专利搜索

PROJECTION EXPOSURE APPARATUS

申请公布号：JPS61202432(A)

申请号：JP19850042719

申请日期：1985.03.06

申请公布日期：1986.09.08

申请人：

CANON INC

发明人：YOMODA MINORU

分类号：G03F9/00;H01L21/027;H01L21/30

主分类号：G03F9/00

摘要：PURPOSE:To automatically regulate an optical system for the thickness of reticles and the alteration of the material in a short time by providing means for regulating the optical distance with respect to the reticles of an alignment optical system and means for detecting the thickness of the reticles. CONSTITUTION:The thickness of reticles 12 is detected by reflecting the light of light emitting elements 10 and receiving by photoreceptors 11. A calculation controller 30 moves an illumination system 6 and an alignment optical system 26 in response to the detected thickness and the refractive index of the reticles 12 input from a refractive index setter 31. The light from an alignment light source 21 is emitted through a half mirror 22, a lens 23 and a mirror 24 to the alignment mark of the pattern surface 12a of the reticles 12, and further emitted through a projecting lens 14 to the alignment mark on a wafer 15. The controller 30 calculates the error amount from the reflected light received by photoreceptors 25, moves a wafer stage 16 and positions the reticles 12 to the wafer 15.