APPARATUS FOR MANUFACTURING THIN FILM
申请公布号:EP1008668(A1)
申请号:EP19980907230
申请日期:1998.03.12
申请公布日期:2000.06.14
发明人:HONDA, KAZUYOSHI;ECHIGO, NORIYASU;ODAGIRI, MASARU;SUNAGARE, NOBUKI
分类号:H05K3/00;C23C14/04;H01L21/283;H01L21/3205;H05K3/04;H05K3/12;H05K3/14;(IPC1-7):C23C14/00;C23C14/56
主分类号:H05K3/00
摘要:<p>In a method wherein, before forming a thin film of, for example, metal on a supporting base in a vacuum, a vapor stream of patterning material for forming a pattern in the thin film is applied from nozzle holes, and the thin film is formed after this liquid has been adhered onto the supporting base, the patterning material is applied from the nozzle holes in such manner that it unifies on the supporting base. Thus, even when the pattern width is enlarged, a pattern can be formed in which the blurring at the pattern edges is small. <IMAGE></p>