PHOTOVOLTAIC DEVICES WITH FINE-LINE METALLIZATION AND METHODS FOR MANUFACTURE,申请号US201514707697-传众专利搜索

PHOTOVOLTAIC DEVICES WITH FINE-LINE METALLIZATION AND METHODS FOR MANUFACTURE

申请公布号：US2016329440(A1)

申请号：US201514707697

申请日期：2015.05.08

申请公布日期：2016.11.10

申请人：

TetraSun, Inc.

发明人：TURNER Adrian Bruce;EGGLESTON Bonneville Dudgeon;SCHULTZ-WITTMANN Oliver;CRAFTS Douglas Edward

分类号：H01L31/02;H01L31/0216

主分类号：H01L31/02

地址：San Jose CA US

摘要：A method for use in forming a photovoltaic device includes forming a doped semiconductor layer on a surface of a semiconductor substrate and forming a metal film on the doped semiconductor layer. A patterned etched resist is formed on the metal film and a dielectric layer is formed on the doped semiconductor layer and the etched resist. A laser having a wavelength absorbable by the patterned etch resist is applied through the dielectric layer to the patterned etch resist to remove the patterned etch resist.

主权项：1. A method for use in forming a photovoltaic device, comprising: forming a metal film on the doped semiconductor; forming a patterned etch resist on the metal film; etching the metal film; forming a dielectric layer on the doped semiconductor and the etch resist; and applying a laser having a wavelength absorbable by the patterned etch resist through the dielectric layer to the patterned etch resist to remove the patterned etch resist.