PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION THEREOF

申请公布号：US2015323863(A1)

申请号：US201514801818

申请日期：2015.07.16

申请公布日期：2015.11.12

申请人：

CHI MEI CORPORATION

发明人：HSU Jung-Pin

分类号：G03F7/00

主分类号：G03F7/00

地址：Tainan City TW

摘要：The present invention relates to a photosensitive resin composition for a color filter and an application thereof. The photosensitive resin composition includes a pigment (A), an alkali-soluble resin (B), a compound having an ethylenically unsaturated group (C), a photo initiator (D) and an organic solvent (E). The alkali-soluble resin (B) includes a first alkali-soluble resin (B-1), and the first alkali-soluble resin (B-1) is copolymerized by a first mixture. The first mixture at least includes an ethylenically unsaturated monomer having a structure of hindered amine (b1-1), an ethylenically unsaturated monomer having an oxetanyl (b1-2) and an ethylenically unsaturated monomer having a carboxylic acid group (b1-3).

主权项：1. A photosensitive resin composition for a color filter, comprising: a pigment (A); an alkali-soluble resin (B); a compound having an ethylenically unsaturated group (C); a photo initiator (D); and an organic solvent (E), and wherein the alkali-soluble resin (B) includes a first alkali-soluble resin (B-1), the first alkali-soluble resin (B-1) is copolymerized by a first mixture, and the first mixture at least includes an ethylenically unsaturated monomer having a structure of hindered amine (b1-1), an ethylenically unsaturated monomer having an oxetanyl (b1-2) and an ethylenically unsaturated monomer having a carboxylic acid group (b1-3).

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