申请公布号：JP5442085(B2)

申请号：JP20120204247

申请日期：2012.09.18

申请公布日期：2014.03.12

分类号：H01L27/146

主分类号：H01L27/146

摘要：PROBLEM TO BE SOLVED: To provide a solid state imaging element having a structure capable of optimizing the thickness of a reflection prevention film formed over a photodiode without being subjected to any limitation in manufacturing process and is free from deterioration in image sensor characteristics even when a general CMOS manufacturing process is applied. SOLUTION: The solid state imaging element includes: a photodiode 11 formed above a silicon substrate 10, which performs photoelectric conversion; a silicon oxide film 17 formed above the silicon substrate 10 so as to cover the photodiode 11; and a silicon nitride film 18 formed over the silicon oxide film 17. The silicon nitride film 18 has a portion where the film thickness is smaller than the film thickness at least at edge area of the silicon nitride film 18 in all or a part of photodiode 11. COPYRIGHT: (C)2013,JPO&INPIT

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