COPOLYMERS FOR COMPOSITIONS SENSITIVE IN NEAR INFRARED REGION OF RADIATION FOR COVERING POSITIVE THERMAL LITHOGRAPHIC PRINTING FORMS,申请号RU20120153993-传众专利搜索

COPOLYMERS FOR COMPOSITIONS SENSITIVE IN NEAR INFRARED REGION OF RADIATION FOR COVERING POSITIVE THERMAL LITHOGRAPHIC PRINTING FORMS

申请公布号：RU2559050(C2)

申请号：RU20120153993

申请日期：2010.09.14

申请公布日期：2015.08.10

申请人：

MAJLAN GRUP

发明人：NGUJEN MI T.;PKHAN AKKHA;NGUJEN-TRUONG V'ET-TKHU;LOKA MARK-ANDRE

分类号：C08F220/10;C08F212/02;C08F220/36;C08F220/38;C08F220/54

主分类号：C08F220/10

摘要：FIELD: chemistry.SUBSTANCE: claimed invention relates to thermal lithographic printing forms and their coatings. Described is polymer, which has general formula, presented below, where a, b, c and d are molar ratios, varying between approximately 0.01 and approximately 0.90; A1 represents monomer units, containing cyano-containing suspended group, in which cyano is not bound directly to main copolymer chain; A2 contains suspended group, containing 5,5-dialkylhydantoin group, aminosulphonamide group or hydroxygroup; A3 contains alkyl or aryl suspended group, aryl is eventually substituted alkyl; and A4 contains suspended group, containing group of carboxylic acid. Formula.EFFECT: provision of high rate of laser image formation, high resolution image, wide processing possibilities, stable storage term, good resistance to impact of chemical substances and long run on printing machine.10 cl, 21 ex, 1 tbl