INSPECTION DEVICE,申请号JP20130032720-传众专利搜索

INSPECTION DEVICE

申请公布号：JP2014163712(A)

申请号：JP20130032720

申请日期：2013.02.22

申请公布日期：2014.09.08

申请人：

HITACHI HIGH-TECHNOLOGIES CORP

发明人：SASAKI ICHIRO;TSUKAMOTO KAZUHIRO

分类号：G01N21/956;H01L21/66

主分类号：G01N21/956

摘要：PROBLEM TO BE SOLVED: To solve a problem of an increased possibility of foreign matters carried to the vicinity of a wafer attaching to the surface of the wafer in a wafer surface inspection device in which the wafer is rotated and its surface is inspected because air immediately above the wafer flows in high speed due to the rotation of the wafer.SOLUTION: An inspection device prevents foreign matters carried to the vicinity of a wafer from attaching to the wafer by being equipped with a stationary (non-rotating) object or a plate which rotates at the same rotation number as the wafer immediately above the wafer, thereby inhibiting air flow immediately above the wafer (a flow induced by rotation of the wafer), reducing the flow speed and maintaining a laminar flow.