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申请公布号:JP5498640(B2)

申请号:JP20050299884

申请日期:2005.10.14

申请公布日期:2014.05.21

分类号:H01L21/205;C23C16/44

主分类号:H01L21/205

摘要:PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning apparatus which allow a worker to work safely without causing damage or corrosion of a contaminated component, when various components of a semiconductor manufacturing apparatus are contaminated with a contaminated matter made of a nitride in a process of manufacturing a nitride semiconductor. SOLUTION: A contaminated component is removed from the apparatus for manufacturing the semiconductor and is put in a reaction chamber 1. A heater 5 is actuated to heat the contaminated component in the reaction chamber 1 to 500 to 1000°C. Then, a first cleaning gas composed of a chlorine gas and a dilution gas is lead into the reaction chamber 1 from a first cleaning gas lead-in pipe 2. This causes a contaminated matter to react with the chlorine gas contained in the first cleaning gas to produce a reactant in the form of a volatile gas, which is discharged from an exhaust gas pipe 4 together with the cleaning gas. Subsequently, a second cleaning gas containing a hydrogen gas is led into the reaction chamber 1 from a second cleaning gas lead-in pipe 3 to cause a chlorine material remaining on the component to react with the hydrogen gas to turn the chlorinous material into a hydrogen chloride gas, etc., which is eliminated. COPYRIGHT: (C)2007,JPO&INPIT

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