METHOD OF FORMING GRAPHENE BAND GAPS,申请号JP20120210152-传众专利搜索

METHOD OF FORMING GRAPHENE BAND GAPS

申请公布号：JP2014065617(A)

申请号：JP20120210152

申请日期：2012.09.24

申请公布日期：2014.04.17

申请人：

KYUSHU MITSUI ALUM KOGYO KK

发明人：HASUO TOSHIHARU;KUBOTA HIROSHI;FUKUYAMA HIDETOSHI;HONMA YOSHIKAZU;SAITO SUSUMU;MASUDA HIDEKI

分类号：C01B31/02;B82Y30/00;B82Y40/00;C25D11/04;C25D11/12;C25D11/16;C25D11/18

主分类号：C01B31/02

摘要：PROBLEM TO BE SOLVED: To provide a method of forming useful band gaps in graphene.SOLUTION: A method includes forming a graphene film on an uneven surface that is active against graphene, and then forming band gaps in the graphene film. The uneven surface has a structure including a recurring predetermined shape and is a surface of an oxide film of an aluminum-based metal. The oxide film is an anodization film formed by anodizing the aluminum-based metal.