SOLID-STATE IMAGING ELEMENT, METHOD OF MANUFACTURING THE SAME, AND CAMERA

申请公布号：JP2014063774(A)

申请号：JP20120206314

申请日期：2012.09.19

申请公布日期：2014.04.10

申请人：

CANON INC

发明人：TSUCHIYA MASAYUKI

分类号：H01L27/146;H04N5/359;H04N5/369

主分类号：H01L27/146

摘要：PROBLEM TO BE SOLVED: To provide a technology advantageous for separation between pixels.SOLUTION: A method of manufacturing a solid-state imaging device includes: a step of forming a first transfer gate 105a and a second transfer gate 105b on a semiconductor substrate via a gate insulating film; a step of forming a resist pattern 108 in which a first opening OP1 and a second opening OP2 are arranged on both sides of a wall part WP; and a charge storage region formation step of implanting ions to the semiconductor substrate via the first opening OP1 and the second opening OP2 to form a first charge storage region 106a and a second charge storage region 106b. The charge storage region formation step includes: a step of implanting the ions to the semiconductor substrate so that the ions are implanted below the first transfer gate 105a; and a step of implanting ions to the semiconductor substrate so that the ions are implanted below the second transfer gate 105b.

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