Optoelectronic device and the manufacturing method thereof,申请号US201213528059-传众专利搜索

Optoelectronic device and the manufacturing method thereof

申请公布号：US8474233(B2)

申请号：US201213528059

申请日期：2012.06.20

申请公布日期：2013.07.02

申请人：

CHEN SHIH-I;HSU CHIA-LIANG;HSU TZU-CHIEH;WU CHUN-YI;HUANG CHIEN-FU;EPISTAR CORPORATION

发明人：CHEN SHIH-I;HSU CHIA-LIANG;HSU TZU-CHIEH;WU CHUN-YI;HUANG CHIEN-FU

分类号：H01L33/06

主分类号：H01L33/06

摘要：An optoelectronic device has a substrate and a first window layer on the substrate with a first sheet resistance, a first thickness, and a first impurity concentration. A second window layer has a second sheet resistance, a second thickness, and a second impurity concentration. A semiconductor system is between the first window layer and the second window layer. The second window layer has a semiconductor material different from the semiconductor system, and the second sheet resistance is greater than the first sheet resistance. A method for manufacturing is provided, having the steps of providing a substrate, forming a semiconductor system on the substrate, and forming a window layer on the semiconductor system. The window layer has a semiconductor material different from the semiconductor system. Selectively removing the window layer forms a width difference greater than 1 micron between the window layer and semiconductor system.