溅射装置

申请公布号：CN102899621A

申请号：CN201110443386.X

申请日期：2011.12.20

申请公布日期：2013.01.30

申请人：

三星显示有限公司

发明人：崔镕燮;许明洙

分类号：C23C14/34(2006.01)I;H01L51/56(2006.01)I

主分类号：C23C14/34(2006.01)I

代理机构：

北京英赛嘉华知识产权代理有限责任公司 11204

代理人：余朦;王艳春

地址：韩国京畿道

摘要：溅射装置包括：具有磁性的多个靶，位于所述多个靶中相邻的靶之间并且具有磁性的反射体，位于所述靶上并形成引导微波的导引空间且具有磁性的波导器，以及位于所述波导器上从而与所述靶、所述反射体以及所述波导器一起形成电子回旋共振区域并具有磁性的限幅器。

主权项：一种溅射装置，包括：多个靶，具有磁性；反射体，位于所述多个靶中相邻的靶之间，并且具有磁性；波导器，位于所述靶上，形成引导微波的导引空间，并且具有磁性；以及限幅器，位于所述波导器上，与所述靶、所述反射体以及所述波导器一起形成电子回旋共振区域，并且具有磁性。

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