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ANHYDROUS POLYMORPHIC FORM B OF BOSENTAN AND USES THEREOF

申请公布号:NZ586900(A)

申请号:NZ20090586900

申请日期:2009.01.02

申请公布日期:2012.10.26

申请人:
CIPLA LIMITED

发明人:RAO, DHARMARAJ, RAMACHANDRA;KANKAN, RAJENDRA, NARAYANRAO;PHULL, MANJINDER, SINGH;SAWANT, ASHWINI, AMOL

分类号:C07D239/69;A61K31/506;A61P9/12

主分类号:C07D239/69

摘要:<p>Disclosed is anhydrous bosentan polymorphic Form B, characterised by having an XRPD pattern comprising peaks at 9.6, 16.1, 17.1, 18.4 and 5 21.8 °2q + 0.2°2q. Further disclosed is a process for preparing the above anhydrous polymorphic form which comprises: adding bosentan to a mixture of ethyl acetate and heptane, heating the mixture to the reflux temperature of the solvent mixture, cooling the mixture to a temperature ranging from 20°C to 30°C, and drying the resulting solid at a temperature above 60°C to obtain anhydrous bosentan Form B.</p>

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