FABRICATION METHOD FOR LOCAL BACK CONTACT PHOTOVOLTAIC CELLS

申请公布号：JP2012160732(A)

申请号：JP20120016884

申请日期：2012.01.30

申请公布日期：2012.08.23

申请人：

IMEC;KATHOLIEKE UNIV LEUVEN KU LEUVEN R&D

发明人：BALTO FIRMUNG;HANS GOVERDE

分类号：H01L31/04

主分类号：H01L31/04

摘要：<P>PROBLEM TO BE SOLVED: To provide a method for fabricating local back contacts, in which: the number of process steps is reduced and thereby the manufacturing cost is reduced; and an open-circuit voltage and a short-circuit current are excellent, resulting in good energy conversion efficiencies. <P>SOLUTION: The method includes the steps of: providing a silicon substrate 2; depositing a surface passivation layer 3 at a rear side of the silicon substrate 2; forming delaminated regions or bubbles 1 at an interface between the surface passivation layer 3 and the silicon substrate 2; depositing a metal layer 4 on the surface passivation layer 3; and performing a metal firing. <P>COPYRIGHT: (C)2012,JPO&INPIT

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