METHOD AND SYSTEM FOR DOUBLE-SIDED PATTERNING OF SUBSTRATES

申请公布号：EP1957249(A4)

申请号：EP20060844789

申请日期：2006.11.30

申请公布日期：2012.07.25

申请人：

MOLECULAR IMPRINTS, INC.

发明人：CHOI, BYUNG-JIN;SREENIVASAN, SIDLGATA V.

分类号：G03F7/00;B29C35/02;G03F9/00

主分类号：G03F7/00

摘要：The present invention is directed towards a method and a system of patterning first and second opposed sides of a substrate. The method and system may employ a mold assembly and obtaining a desired spatial relationship between the first and second opposed sides of the substrate and the mold assembly. In a further embodiment, the method and system may employ a first and a second mold assembly.

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