ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION,申请号US201013320116-传众专利搜索

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION

申请公布号：US2012094235(A1)

申请号：US201013320116

申请日期：2010.05.20

申请公布日期：2012.04.19

申请人：

TSUCHIHASHI TORU;TSUBAKI HIDEAKI;SHIRAKAWA KOJI;TAKAHASHI HIDENORI;TSUCHIMURA TOMOTAKA;FUJIFILM CORPORATION

发明人：TSUCHIHASHI TORU;TSUBAKI HIDEAKI;SHIRAKAWA KOJI;TAKAHASHI HIDENORI;TSUCHIMURA TOMOTAKA

分类号：G03F7/20;G03F7/027

主分类号：G03F7/20

摘要：According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below.