POWDER, SINTERED BODY AND SPUTTERING TARGET, EACH CONTAINING ELEMENTS CU, IN, GA AND SE, AND METHOD FOR PRODUCING THE POWDER,申请号WO2011JP64713-传众专利搜索

POWDER, SINTERED BODY AND SPUTTERING TARGET, EACH CONTAINING ELEMENTS CU, IN, GA AND SE, AND METHOD FOR PRODUCING THE POWDER

申请公布号：WO2012002337(A1)

申请号：WO2011JP64713

申请日期：2011.06.27

申请公布日期：2012.01.05

申请人：

KOBELCO RESEARCH INSTITUTE, INC.;HYOGO PREFECTURE;EHIRA MASAYA;NAMBU AKIRA;KASHIWAI SHIGEO;FUKUZUMI MASAFUMI

发明人：EHIRA MASAYA;NAMBU AKIRA;KASHIWAI SHIGEO;FUKUZUMI MASAFUMI

分类号：C01B19/00;B22F1/00;B22F9/08;C22C9/00;C22C28/00;C23C14/34

主分类号：C01B19/00

摘要：<p>Disclosed are: a Cu-In-Ga-Se powder which contains Cu, In, Ga and Se and is free from occurrence of cracks during sintering or processing; and a sintered body and a sputtering target, each of which uses the Cu-In-Ga-Se powder. Specifically disclosed is a powder containing Cu, In, Ga and Se, which is characterized by containing a Cu-In-Ga-Se compound and/or a Cu-In-Se compound in an amount of 60% by mass or more in total. It is preferable that the powder contains 20% by mass or less of an In-Se compound and/or 20% by mass or less of a Cu-In compound.</p>