METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD

申请公布号：US2011244394(A1)

申请号：US200913132375

申请日期：2009.01.15

申请公布日期：2011.10.06

申请人：

DAICEL CHEMICAL INDUSTRIES, LTD.

发明人：EGUCHI AKIRA;NISHIMURA MASAMICHI

分类号：G03F7/004;G03F7/20

主分类号：G03F7/004

摘要：Disclosed is a method for producing a resin solution for photoresists, which includes the steps of heating and thereby aging a solution at 30° C. to 90° C. for 30 minutes or longer, the solution containing, in a solvent, a photoresist resin capable of being alkali-soluble by the action of an acid; and filtering the aged solution through a filter medium having a pore size of 1 μm or less. The method gives a photoresist composition having good filterability which enables uniform patterning. The method also gives a resin solution for photoresists which is stable over a long time, namely, a resin solution for photoresists which maintains good filterability even after long-term storage.

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